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Lecture 33 (CHE 323) Statistical Process Control (SPC)

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0:01

this is chemical processes for micro and

0:03

nof Fabrication I'm Chris Mack and this

0:05

is lecture 33 semiconductor

0:09

manufacturing statistical process

0:11

control last time we looked at another

0:15

important aspect of semiconductor

0:17

manufacturing yield and we spent some

0:20

time on one of the two uh yield

0:23

detractors

0:25

defects today with our introduction very

0:28

very brief introduction to statistical

0:30

process control we're going to look at

0:33

the second detractor of yield uh

0:36

parametric yield

0:41

loss the process uh can be controlled uh

0:46

in in certain ways uh that we're going

0:50

to talk

0:51

about and we have various metrics that

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we use to help us control this process

0:58

um but when it comes to process control

1:01

we generally think about the parametric

1:03

yield side that we're trying to control

1:05

we also need to control the defects but

1:07

that's kind of a separate category of of

1:11

control defect control when we talk

1:13

about process control we're generally

1:14

talking about controlling the

1:16

parametrics of our process what are the

1:19

parametrics things like film thicknesses

1:22

and um doping concentrations and feature

1:26

sizes and Edge depths Etc all the things

1:30

that we can measure and put a numerical

1:31

value on

1:33

it parametric yield loss comes from

1:37

these parametrics these parameters like

1:40

a film thickness um that is off-kilter

1:43

it's far enough away from its desired

1:46

value that it causes the device to not

1:49

function properly if we want parametric

1:51

yield to be

1:53

high there are two ways that we can do

1:55

it uh one is we design a process that

2:00

can tolerate high yields uh excuse me

2:03

that can tolerate large amounts of

2:06

process variation and still produce high

2:09

yields uh that's great if we have a

2:11

process that's insensitive to variation

2:14

in a certain process variable then we

2:17

don't have to worry so much about that

2:18

process variable the second thing is

2:21

once we have an accept unn acceptable

2:24

amount of process variation that we can

2:25

tolerate we need to make sure that we

2:27

control the process to stay with within

2:30

that acceptable

2:32

variation there are two tools that we

2:35

often use for process control actually

2:37

there's quite a few more than just these

2:39

two but there's only two we're going to

2:40

talk about statistical process control

2:43

and process capability metrics those are

2:46

the topics of today's lectures lecture

2:49

but another very important area of

2:52

process control is called APC advanced

2:55

process control it's basically a

2:57

feedback loop where we make measurements

3:00

uh of of parameters of Interest like uh

3:04

film thickness and then we use a

3:08

feedback loop to control the equipment

3:11

that performs that uh deposition for

3:13

example um to try to keep it in control

3:17

so it's a feedback based uh process

3:19

control mechanism fascinating topic

3:21

we're not going to be able to talk about

3:22

it in this class instead we're going to

3:24

focus on SBC and process capability

3:28

metrics what is PC it's a tool to detect

3:32

systematic process

3:35

excursions so we've got a variable and

3:38

it has some known statistical history it

3:41

tends towards this mean and this

3:43

standard deviation for example now if we

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see uh some variation in that process

3:48

parameter that is unexpected based on

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its history its known statistical

3:53

history we call that a process Excursion

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and the SBC is a tool to identify when a

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process Excursion

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occurs for example here's the mean

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nitride thickness versus Lot number so

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we process a lot of Wafers say 25 Wafers

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at the same time then we might take

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three of those Wafers and measure the

4:15

nitride thickness and we might measure

4:17

the nitride thickness at Five Points on

4:20

the wafer and we'll average all of those

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together and get a mean nitride

4:27

thickness value we might get a standard

4:30

deviation might get some other

4:31

parameters as well um but we're going to

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focus just on that one parameter the

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mean nitride thickness and then we plot

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that mean as a function of Lot number

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every day we process another lot or

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maybe we process a dozen lots a day some

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something like that but we we sequence

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through lot numbers and we plot that

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mean measured mean nitride thickness and

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we get some variation of that mean

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value and what we want to do is look

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at this variation and

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ask is this particular point a problem

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is it just normal statistical

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fluctuations or is it something else

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going on maybe something happened to

5:19

this lot that's different than the other

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Lots that's what SPC is all about the

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SPC method goes like this we establish

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an historical mean and standard

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deviation for a variable under under

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consideration now for example I said the

5:37

mean nitride thickness what I mean by

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that is the mean measurement of one lot

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the lot mean and then we'll plot that as

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a function of lots and that in and of

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itself will have a mean value in a

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standard deviation so for example if we

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look here uh this is the mean nitrate

5:55

thickness but this is the mean within

5:58

one lot we can also calculate Cal the

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mean value of all these data points

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which is the mean uh of all the lots and

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then of course we can have a standard

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deviation historically the standard

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deviation of this Min nitrite thickness

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um amongst all the

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Lots this mean will follow a normal

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distribution now we know that's true

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because of the central limit theorem if

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you haven't studied that or if you've

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forgotten it from your statistics or

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probab ility of course it's very very

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important you might go back and look it

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up basically says that if uh I sum up a

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bunch of

6:39

variables then uh that sum will follow a

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normal distribution even if the

6:44

individual variables do not so this mean

6:47

value we can track and know that it has

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an approximately normal

6:53

distribution then we'll use a three

6:55

sigma probability as an indicator of a

6:58

problem now in other words suppose some

7:00

event occurs we can calculate the

7:03

probability that that event occurred

7:06

randomly based on this normal

7:09

distribution if the probability of the

7:11

event occurring randomly is less than

7:14

3% then chances are this is an error

7:20

some systematic deviation from what is

7:22

expected and not just normal V pattern

7:25

variation prob probabilistic

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variation the point . 3% is based on the

7:30

three sigma probability 97 you know

7:34

99.7% of the time were within 3 Sigma of

7:38

the

7:40

mean so we'll use this uh 3 Sigma

7:43

probability um to indicate that

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something is likely wrong now it's not a

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guarantee that it's a a systematic error

7:53

but it's probable and the result is what

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we call the Western Electric rules since

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this was was developed by the Western

8:00

Electric Company some time ago the main

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Western Electric rules are these and

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there are some other ones that we're not

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going to talk about but these are the

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main ones it gives you a feel for what

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these rules are all

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about for example we say that if any

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single point Falls outside of the plus

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or minus 3 Sigma limits then we we we

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say that the this Western Electric rule

8:25

has been

8:27

violated there's only A3 % probability

8:30

of that happening randomly so if it

8:33

happens there's a likelihood fairly High

8:37

likelihood that it's something besides

8:39

just random

8:41

variation another possibility eight

8:44

successive points are above the mean or

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eight successive points are below the

8:49

mean either one of these events has a 4%

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probability of

8:55

occurring and that's close enough to 3%

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that we say if this happens the this

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Western Electric rule has been violated

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now what could cause this to happen well

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a mean shift something happens in our

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process and now uh the the mean value of

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that parameter has shifted to a higher

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level or to a lower level and I have a

9:16

new uh mean uh that will result in a lot

9:21

something like you know 8 sucessive

9:23

points being above or below the

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mean Another Western elect rule if two

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out of three successive points are

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between 2 Sigma and 3 Sigma or between

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minus 2 Sigma and minus 3 Sigma of the

9:37

mean then this rule is violated again

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there's about a 3% probability of this

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happening uh so if it does happen we say

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it's uh an indicator that there might be

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a problem and the last one that we'll

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talk about four out of five successive

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points are greater than one Sigma that

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is between between 1 Sigma and 3 Sigma

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of the mean or between minus 1 Sigma and

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minus 3 Sigma there's about a 5%

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probability that either one of these

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might happen uh so it fits our general

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rule of thumb of about 3% probability uh

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events get flagged um as potential

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problems how do we use these Western

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Electric

10:25

rules these rules can detect both a

10:28

shift in the mean and some growth in the

10:31

variation of the parameter there's a few

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more rules besides the one we've

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mentioned but the ones I mentioned give

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you a flavor for what's going on they're

10:39

the most important rules and then when a

10:42

rule is violated we sound the alarm now

10:45

it's not literally an alarm going off in

10:47

the Fab but uh essentially when that

10:51

happens um you get a page or you get a

10:54

text that says you need to come in and

10:57

look at this if you're the engineer in

10:58

char charge for example an alarm means

11:02

it needs to be investigated generally we

11:05

uh we do all of this data analysis and

11:09

checking the Western Electric rules in

11:11

an automated uh fashion with software

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nobody's actually looking at the data um

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except for software uh so the software

11:20

will automatically send an email or send

11:22

a text or something like that when a

11:25

rule has been violated and it's called

11:27

an alarm when you get an alarm you look

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at it and try to decide is this a

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problem is it a is it something that

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might have uh happened in the Fab that

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caused uh something to go wrong can I

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find that cause and can I fix it

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sometimes of course these alarms will be

11:47

false in fact about 3% of the time uh

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these things will happen just due to

11:54

Pure Randomness so sometimes you'll have

11:57

some false alarms and and that's okay

11:59

that's the nature of the game but you

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need to separate out what's a false

12:03

alarm from what's a real problem for

12:06

example you might find that the nitride

12:09

thickness um had a mean shift so eight

12:13

out of eight data points in a row were

12:16

above the mean and when you go and look

12:18

you might notice

12:19

that the point in time when the mean

12:23

shift occurred happened to be right

12:25

after you clean the tube of your CBD

12:28

furnace so maybe uh there was a problem

12:31

with the cleaning process and as a

12:33

result uh the nitride thickness is no

12:37

longer uh in Spec um maybe it was

12:40

because you changed some gas canisters

12:42

for the processed gases used in the

12:44

nitride uh CBD process something like

12:47

that so you look for a cause and then

12:50

try to address

12:52

it we also can use uh this these rules

12:56

as a measure of how well our processes

12:59

in control we measure something called

13:01

the average run length that is how many

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number of points on average are there

13:06

between alarms if we're having alarms

13:08

all the time then we have something

13:11

wrong in our Fab if we have a fairly

13:13

large number of points between alarms on

13:15

average then things are looking good so

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we can also use the average run length

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as a way of looking at the Fab in

13:22

general and saying things are going well

13:25

or things are not going

13:27

well

13:29

here's an example of an SP spc's chart

13:32

so we've plotted the historical mean the

13:34

red line here and then we have a

13:37

historical value for Sigma and we plot

13:39

the plus 1 plus 2 + 3 -1 -2 -3 values

13:45

and sure enough this one data point that

13:47

we saw

13:48

before is greater than 3 Sigma away from

13:51

the mean and so we would flag it as an

13:54

alarm and we'd want to go look at what

13:57

might have caused that

13:59

um when it

14:00

happened uh we might search through this

14:03

data to look for other possible alarms

14:06

as well but I don't see any when I look

14:08

at

14:10

it SBC charts are ubiquitous in the

14:14

world of semiconductor manufacturing as

14:16

I said it's almost all automated

14:18

measurements are made and the the data

14:20

automatically goes to a computer system

14:24

called a manufacturing execution system

14:26

or Mees software uh that collects the

14:29

data generates the charts uh you can

14:32

look at them online anytime you want and

14:35

then if there is an alarm it will

14:37

automatically send out emails or texts

14:39

to people to let them

14:42

know now another important uh metric

14:46

that we use is something called process

14:48

capability s SPC charts show how the

14:51

process is doing compared to his

14:54

historical Behavior that's very valuable

14:58

because if something changes you want to

15:00

know but that's not all we want to know

15:03

we would also like to know how the

15:06

process is behaving compared to the

15:09

specifications for the process what is

15:12

the spec what is the uh specification we

15:15

usually say spec um of a parameter so

15:18

example nitrite thickness we'll have a

15:20

spec on the mean and the allowed

15:23

variation of the nitride thickness where

15:25

does this spec come from well this spec

15:29

is based on the idea that if we keep the

15:31

parameter within the limits mean plus or

15:35

minus some

15:36

range then we're pretty sure our yield

15:39

is going to be high and the performance

15:41

of the device the performance of the

15:43

chip will not be affected because of

15:45

this variation in the

15:47

parameter we get these specs based on a

15:50

combination of experience and modeling

15:53

so we have modeling of how uh the

15:56

entire process will behave

15:59

modeling how the device will behave as a

16:01

function of of process parameters and we

16:04

can have a model that might tell us how

16:06

variations in the nitride thickness for

16:07

a particular step might affect the

16:09

overall performance or we might just

16:11

have some experience that says it needs

16:13

to be like

16:15

this um based on that we'll put together

16:19

uh process specifications and we'll ask

16:22

how does this long-term statistical

16:24

Behavior the historical statistical

16:26

behavior of a process compare

16:29

to what our specs are for that process

16:31

that's a very different question than

16:32

what SPC is designed to answer and we

16:35

use a metric called the process

16:37

capability index to answer that question

16:41

so our specs are defined by two

16:42

parameters the upper spec limit USL and

16:45

the lower spec limit

16:47

LSL and the difference between these is

16:50

the range of the parameter value that is

16:55

acceptable then we compare that range of

16:58

acceptable values to the historical Fab

17:01

performance so Sigma would be the

17:03

standard deviation of the actual

17:05

variable in the Fab so 6 Sigma would be

17:08

a plus and minus 3 Sigma range of that V

17:11

variable and then we'll look at the

17:13

compare we'll compare with this ratio

17:16

the upper spec limit minus lower spec

17:18

limit range of the the needed value

17:21

compared to the actual performance Six

17:24

Sigma that ratio is called C subp

17:28

the process capability

17:31

index higher CP means a more capable

17:34

process that means our uh performance

17:38

fits well within the spec limit

17:43

range H but there's a problem this

17:46

metric will not detect a mean shift and

17:49

it's only looking at the standard

17:51

deviation not at the mean of of the Fab

17:54

data so we going to we're going to

17:56

modify C subp

17:58

to

18:00

include mean variations and our new

18:04

metric will be called

18:06

CPK and that's how we pronounce it

18:08

that's what we always say what's the CPK

18:10

of the process for example CPK is

18:13

nothing more than this process

18:14

capability index C of P multiplied by 1

18:17

minus K and K is a term to to answer the

18:23

question has the mean drifted away from

18:26

the target value for that so this mean

18:29

here is the historical data from the Fab

18:34

and the target is the spec the actual

18:35

value we're trying to get for the mean

18:38

and then uh the ratio of of this

18:41

variation to 3 Sigma which is half of

18:44

the upper spec limit minus lower spec

18:46

limit is what K actually means so we

18:51

modify CP to include the possibility of

18:54

a mean

18:55

drift and the result is uh a new metric

18:59

CPK that includes both the variation and

19:02

the mean of the historical

19:05

data if CPK is bigger than one we have a

19:09

process with the possibility of success

19:13

CPK is less than one we will have yield

19:17

failure because of this um parameter

19:23

right obviously there's a CPK for every

19:25

process parameter that we monitor so a

19:28

CPK for nitrite thickness uh CPK for uh

19:31

dopent concentration a CPK for um uh

19:36

Junction depth for example everything

19:38

that we might measure in the Fab will

19:40

have a CPK value and if the CPK is less

19:43

than one that means that parameter is

19:48

negatively impacting the yield in my

19:52

fab so we want it it has to be greater

19:54

than one minimum requirement if it's

19:56

bigger than 1.5 it's good we've got a

19:58

good process and if it's bigger than two

20:01

we say the process is great this is

20:04

often called a Six Sigma quality and in

20:07

in the world of

20:08

manufacturing uh you can advertise that

20:11

you have a Six Sigma process if your CPK

20:14

is bigger than two on all the parameters

20:17

of course what it might mean is that

20:19

your specs are too loose uh and maybe

20:21

you could design better chips if you

20:24

were willing to use tighter specs uh so

20:27

that's another possibility if your CPK

20:29

is bigger than two but generally the

20:31

higher the CPK the

20:34

better so what have we learned in this

20:37

second of two lectures on the topic of

20:41

semiconductor

20:43

manufacturing well you should be able to

20:45

quickly answer these three questions

20:48

what is the guiding principle of

20:52

SPC what are the Western Electric

20:57

rules

20:59

what do you do when there is an SBC

21:03

alarm actually I apologize there's more

21:06

than three questions here I I forgot um

21:09

what is the difference between CP and

21:14

CPK and finally what constitutes a

21:17

mediocre good or a great capability in

21:23

my

21:25

manufacturing well that's our very brief

21:27

disc discussion of semiconductor

21:31

manufacturing next time we'll go back to

21:33

unit

21:34

processes and start talking about etch

21:38

till then

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